1本报告由凯尔·布朗少校编写。感谢大卫·格林比兹(David Glinbizzi),约书亚·奥瓦迪亚(Joshua Ovadia),比阿特丽斯·威尔逊(Beatrice Wilson)和伯纳德·刘(Bernard Liu)的出色会议记录。
8:35 AM AM综合计量学OVADIA ILGAYEV(NOVA LTD)8:55 AM AM机器学习与基于物理学的CMP建模用于新兴技术的CMP建模Ruben Ghulghazaryan(SIEMENS工业软件)9:15 amnotight viorel balan(New Insight viorel balan)(new Insight viorel balan)(cea)。 Edge-Over-Erosion for Advanced CMP Processes Davit Piliposyan (Siemens Industry Software) 9:55 AM Morning Break Session I Session chair: Catharina Rudolph 10:15 AM Automatic Analysis of CMP Dishing in Via Arrays from AFM Images Jan Langer (Fraunhofer ENAS) 10:35 AM Next Generation Particle Detection in CMP Slurries Rashid Mavliev (Mavlipa LLC)上午10:55抛光垫的关键特征大小及其性能Mary McGahay(Smart Pad Inc)