Arcnl的生存能力是完善的,对纳米光刻的科学卓越和社会影响产生了重大贡献。任务仍然专注于协作,灵活性和创新,与半导体行业不断发展的需求保持一致。战略计划包括加强国家和国际合作,刺激学术机构并促进开放科学。arcnl将继续在快节奏的纳米技术领域面临挑战,值得关注以保持领先地位并保持足够的范围。虽然与ASML的密切合作伙伴关系是有益的,但可见度和多样化的资金来源(例如由Arcnl Pi领导的欧洲项目)对持续增长至关重要。解决脆弱性,优化利益相关者的关系以及展示Arcnl在全球范围内的独特性是长期成功的推荐策略。
Yahia Mostafa [ARCNL] 固态激光产生的等离子体作为纳米光刻的 EUV 光源 Mark van Ninhuijs [TUE] 超冷等离子体的微波腔谐振光谱 Lucas Poirier [ARCNL] Nd:YAG 激光产生的等离子体膨胀过程中的强各向异性离子发射
chair : Said Rodriguez 08.45 I 04 Natalia Berloff (Applied Mathematics and Theoretical Physics, University of Cambridge, United Kingdom) “Gain-based computing with coupled light-matter systems” 09.30 Short talks O 11 Stan de Lange (Advanced Research Center for Nanolithography, ARCNL) “Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 micrometer-wavelength laser for future EUV lithography” O 12 Anubhav Paul (Imaging Physics, Delft University of Technology) “Coherent Fourier scatterometry for subwavelength shape determination” O 13 Olga Duda (HFML-FELIX Laboratory, Radboud University) “Energy flow after vibrational excitation of small molecules” O 14 Kevin Peters (University of Bonn, Germany) “储层诱导的光子冷凝物阵列中的拓扑阶段”